Brief Introduction
The magnetron sputtering is a special type of technic in which the magnetic field is used for enhacing the gas glow discharge in vacuum condition. Model CMS-900 has a co-as shaped target and eight planetary substrate racks of the diameter of 180mm. Appraised by the specialists, it has been found that the co-ax magnetron sputtering is a new technic of wide applications and the film prepared by this model has the advantages of evenness, good cohesion and circum-radiation, and low substrate temperature.
Main Technical Specifications
| 1 | Vacuum Chamber : | (d x L) | 900 x 1150mm |
| 2 | Pumping Time : | (Empty Clean Chamber) From 760 to 5 x 10-4 Torr | within 15 minutes |
| 3 | Ultimate Vacuum | (Empty Clean Chamber) | 5 x 10-5 Torr |
| 4 | 8 planetary Substrate Racks: | Maximum diameter of the substrate<180mm Revolving Speed Range : Adjustable, 0 ~ 80 (rpm) | |
| 5 | Trolley : | Used For Receving the Racks | |
| 6 | Total Power : | 380V 50Hz, Three Phases, 40 kW (Maximum Visible) | |
| 7 | Water Consumption : | Feed Water Temperature<25。C | 1000 I/h |
| 8 | Overall Dimensions : | (L x W x H) 565 x 800 x 1800mm (Electrical Cabinet) | 3065 x 2500 x 1800mm |
| 9 | Total Weight : | 3500 kg |