CWD-500 Oilless Ultra Vacuum Coating System For Electronic Industry

無油超高真空電子束鍍

簡介

        CDW-500 無油超高真空電子束鍍膜機是半導體集成電路硅片鋁膜的蒸發設備，具有無油蒸氣污染、真空度高、鋁膜鈉離子污染少、膜層均勻、膜層爬越台階性能好及工作效率高等優點。

        此機採用225。磁偏轉電子槍做為蒸發源，坩堝內容35cc，蒸發速率(Si-AI) 3000 ~ 4000埃 / 分。

        基片夾具為球面行星轉動式。

        用紅外線燈加熱機片，8分鐘基片升溫達 200^。C，溫度可控。

        採用寬量程真空計 (範圍 5 x 10^-1 ~ 4 x 10^-11托) 作真空測量。

        採用數字顯示石英晶體振蕩膜厚控制儀監控膜厚。

        此機以 JCW-350無油超高真空鈦泵機組抽氣。主泵為400升 / 秒三極式濺射離子泵，輔助泵為1000~1500升 / 秒鈦球升華泵，前級泵為二個1.5kg分子篩級附泵，並附有一奪機械泵加吸附阱輔助前級系統，供在缺乏液氮情況下使用。

主要技術性能規範

(1)    工作室尺寸                         f500 x 640mm

(2)    極限真空度                         5 x 10^-9 托

(3)    恢復真空時間                     760 ~ 10-7托，1小時之內

(4)    電子槍功率                         10kW，10000V，1A     可調

(5)    基片架自轉速度                 0 ~ 36秒 / 分    可調

(6)    基片烘烤功率                      3kW     可調

(7)    蒸發硅片量                         f35 ~ f40    硅片120片

(8)    總功率                                 25kW

(9)    總耗水量                             500升 / 小時

(10)    佔地面積                         2000 x 2000 x 2400mm

(11)    總重量                             2000kg

　

Brief Introduction

        Model CWD-500 is designed for ecaporating aluminium on siliconchips of semiconductor IC with the characteristics of no oil-steam pollution, high vacuum, less contamination of natrium ion on the aluminous film, even distribution of film layers, excellent step-function of the aluminous film and high efficiency in operation.

        This model adopts a 225 magnetic-deflection electron beam, gun as the evaporation source with the crucible capacity of 35cc and evaporating rate of  (Si-AI) 3000 ~ 4000 A/min.

        The substrate rake is of planetary movement.

        Heated by quartz halogen lamp, the controllable substrate teperature can be raised up to 200。C in 8 minutes.

        Wide-ranging vacuum gauge (range from 5 x 10-1 to 4 x 10-11 Torr) is used for vacuum measurement.

        Film thickness is monitored by digital quartz crystal film-thickness monitor.

        This model is pumped by JCM-350 oilless ultra-high vacuum titanium pumping system with a triple-electrode-typed ion sputtering pump of 400 I/sec, serving as the main pump, and a titanium sublimation pump of 1000 ~ 1500 I/sec as the supplementary pump. The forestage pumps are composed of two molecularsieve adsorptive pumps of 1.5kg and also attached a set of mechanical pumps with adsorptive traps as forestage supplementary system, only used when nitrogen is lacked.

　

Main Technical Specification

(1)    Vacuum Chamber:                                       500 x 640mm

(2)    Ultimate Vacuum:                                         5 x 10-9 Torr

(3)    Pumping Time:                                             From 760 to 10-7 Torr within an hour

(4)    Power of Electron Beam Gun:                     10kW 1000V 1A (Adjustable)

(5)    Revolving Speed of Substrated Rack:          0 ~ 36 rpm (Adjustable)

(6)    Baking Power:                                             3 kW (Adjustable)

(7)    Numbers of Siliconchip:                               35mm ~ 40mm x 120 pcs

(8)    Total Power:                                                 25kW

(9)    Total Water Consumption:                           500 I/h

(10)    Overall Dimensions:                                   2000 x 2000 x 2400mm

(11)    Total Weight:                                             Approx. 2000 kg