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- CMS-900 CO-AX Magnetron
Sputting Coating System
- 同軸磁控濺射鍍膜機
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- 簡介
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磁控濺射技術是利用磁場來增強真空中氣體輝光放電的一種特殊濺射技術。CMS-900同軸磁控濺射鍍膜機有一同軸形靶,有可公自轉的工件轉動架八隻,直徑
f180
毫米。經專家鑒定認為 :
同軸磁控濺射技術是一項具有廣泛應用前途的新工藝技術。其所製備的薄膜具有均勻、結合力強、繞射性好、工件溫度低等特點。
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- 主要技術性能規範
- (1) 真空尺寸
內徑 x 直邊長度 900 x 1150 毫米
- (2) 抽氣時間
清潔空容器從 760 到 5 x 10-4<15分鐘
- (3) 極限真空
清潔空容器為 5 x 10-5托
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- (4) 工件行星轉動架轉軸 8 根,最大工件直徑<180毫米,
- 轉速調節範圍 0 ~ 80轉 / 分。公自轉。
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- (5) 移動式小車
承接轉籠架
- (6) 整機功率
380伏50周三相,40千瓦(最大視在功率)
- (7) 耗水量
進水溫<25。C 1000升 / 小時
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- (8) 外形尺寸
3065 x 2500 x 1800 毫米
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565 x 800 x 1800 毫米
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- (9) 總重量
3500公斤
- Brief Introduction
- The magnetron sputtering is a special type of
technic in which the magnetic field is used for enhacing the gas glow discharge in vacuum
condition. Model CMS-900 has a co-as shaped target and eight planetary substrate racks of
the diameter of 180mm. Appraised by the specialists, it has been found that the co-ax
magnetron sputtering is a new technic of wide applications and the film prepared by this
model has the advantages of evenness, good cohesion and circum-radiation, and low
substrate temperature.
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- Main Technical Specifications
- (1) Vacuum Chamber :
(d x L)
900 x 1150mm
- (2) Pumping Time :
(Empty Clean Chamber)
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From 760 to 5 x 10-4 Torr
within 15 minutes
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- (3) Ultimate Vacuum
(Empty Clean Chamber
5 x 10-5 Torr
- (4) 8 planetary Substrate Racks:
Maximum diameter
of the substrate<180mm
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Revolving Speed Range : Adjustable, 0 ~ 80 (rpm)
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- (5) Trolley :
Used For Receving the Racks
- (6) Total Power :
380V 50Hz, Three Phases, 40 kW (Maximum Visible)
- (7) Water Consumption :
Feed Water Temperature<25。C
1000 I/h
- (8) Overall Dimensions :
(L x W x H)
3065 x 2500 x 1800mm
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565 x 800 x 1800mm (Electrical Cabinet)
- (9) Total Weight :
3500 kg
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浩晴真空機械設備公司 Ho Ching Vacuum Machinery & Equipment Co. (浩晴貿易有限公司 HO CHING TRADING LTD.) |
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