- 簡介
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此設備為最新型箱式光學多層鍍膜機。方箱型不z鋼工作室提供寬闊的工作面積,並配以大容量抽氣系統;
光學測厚系統固定裝在箱形工作室上部;
整機安裝到淨化工作室方便容易。
該設備運用於光學薄膜技術中蒸鍍多層膜、高反射膜、寬(窄)帶濾光片。是光學儀器、激光工業、眼鏡及照相等行業科研及生產之必需設備。也運用於電子工業中蒸鍍機型元件薄膜電路等。
此兩型設備真空性良好,機械結構可靠耐用,穩定的膜厚測試系統工作精度高,多坩堝帶有
H-Y
掃描的磁偏轉電子檢蒸發源,並具有新型的箱式結構外形,操作方便。
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- 特點
- 使用高性能抽氣機組。
- 此兩型設備分別配以 f400及 f600擴散泵抽氣系統,使工作室達7x10-2Pa低於15分鐘,極限真空達6.6x10-4Pa
- , 在工作狀態下(電子槍、烘烤、轉動)真空度可保持在1.3x10-2Pa
以上。
- 工作室內各裝置符合使用要求。
- 此兩型設備箱體容積分別為648x668x790和770x800x916,為蒸發源等裝置的安裝提供了足夠大的底板位置。室內工件盤可根據用戶需要,制為球面盤和平面盤,工件轉動平穩。ZS-700可另配有三只盤式行星轉動裝置,每盤直徑為
f430。
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帶有溫度控制儀的碘鎢燈烘烤功率分別為 3kW 和 4.5kW,
以保證基片溫度達300。C要求。
- 具備大功率的270。磁偏轉四坩堝電子槍和兩套電阻蒸發電源,及兩組氣動控制的蒸發擋板。
- 結構新穎的 3kW/0.6kW
離子轟擊能滿足使用要求。
- 工作穩定的高精度膜厚測試系統。
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本機為提高膜厚測試精度,對系統的主要配件及結構件作了慎重的選擇和考慮。
- 主放大器MK-1型,光棚單式儀WDG-30型,光電倍增管GDB-423型,
高壓電源FH-426B 型,穩定直流電源CG-4型,帶有直接驅動調制光板的39L1224型調制電機,光束會聚於調制光板、比較片、接收光孔及單色儀入口。
- 光譜波長範圍3000~8500A。其他波長範圍可調節單色儀光棚線數解決。
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- 規格/型號:
ZS-500
ZS-700
- 工作室尺寸:
- 箱式(長x寬x高)
648x668x790mm 770x800x916mm
- 工作盤最大外徑
f550mm
f650mm
- 極限真空
6.6x10-4Pa
6.6x10-4Pa
- 抽氣時間
7x10-3Pa<15min 7x10-3Pa<15min
- 蒸發源、多坩堝偏轉
- 電子槍帶 X、Y掃描、電阻蒸發源(兩套) 5kW
5kW
- 工件烘烤溫度和功率
300。C / 3kW
300。C / 4.5kW
- 工件轉速(轉每分)
0~30r / min
0~30r / min
- 離子轟擊
0.6kw / 3kv
0.6kw / 3kv
- 擴散泵
k-400
k-600
- 機械泵
2X-30A
2X-70A
- 膜厚測試系統
MK-1
MK-1
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System Extreme Value Method System Extreme Value Method
- 真空測量
CG-Z
CG-Z
- 平均功率
20kW
32kW
- 佔地面積x高(m)
2.5 x 2.6 x 2m 2.7 x 2.85 x
2.74m
- Brief Introduction
- Model ZS-500 and Model ZS-700 are
cabinet-shaped optical multi-layer coating systems, designed recently to repiace the
previous products of our factory so as to improve the operation functions of the systems.
The square stainiess steel chamber provides spacios working area, where large capaclty
pumping system can be installed and the optical film-thickness monitor system can be fixed
on the upper part of the chamber. The whole system can be easily installed in the cleaning
room. For the optical film coating, both models are suitable for coating multi-layer film,
high-reflecting film, high-transparent film and wide(narrow)band filter glass, and for the
utilization in both scientific research and production. They are the necessary equipments
in the optical instrument industry, such as laser-producer, eye-glasses, camera and so on,
and also suitable for the evaporization of metais on micro-components in electronic
industry.
These two models provide high operation
vacuum, reliable an durable mechanical structure, high-accuracy of the stable
film-thickness monitor system, the multi-crucible sources with the magnetically deflected
electron beam gun scanning in x-y directions. The cabinet-shaped structure is new in
appearance and the systems are easy to be operated.
- Large Capacity Pumping Systems
- f400 and f500 diffusion pumping systems are mounted to both
models respectively, so that the pumping is highly efficient. The vacuum chambers can be
pumped to 7x10-3pa within 15 minutes, with the ultimate vacuum of 7x-5Pa. Under the
working condition (operating the electron beam gun, baking and turning the system) the
vacuum can be maintained at least 1.3x 0-3Pa.
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- Perfected to Meet Working Reguirements
- The dimensions of the cabinets of Model
ZS-500 and Model ZS-700 are 648x668x790mm and 770x800x916mm respectively, offering a space
large enough for installing baseplate of evaporation source unit. Two Ways of Driving
Substrates: spherical driving and plane driving, smoothly turning the substrates. In
addition, Model ZS-700 is attached with a three-plate-types planetary substrate
holder, each plate of f430mm.
- The baking power of lodo-tungsten lamp with a
temperature controller is 3kW or 4.5kW, so as to keep the substrate at temperature up to
300•C.
- There is one set of the quad-crucible
electron gun with sufficient power magnetically deflected in 270。, two sets of
resistance evaporation power sources , and two sets source shutters controlled by
pneumatic pump.
- The newly-structured 3kV / 0.6kW glow
discharge can meet the requirement of ion bombardment.
- The measurement of the film-thickness is
quite accurate and the operation of this monitor is stable.
- All the main parts and components in both
systems are selected with great care in order to meet the accuracy in measuring the
thickness of the film.
- Each system includes MK-1 main ampllfler,
WDG-30 optical grating spectrograph, GDB-423 photo-multipller, FH-426B high-voltage
supply, WY-1 stabillized d.c. supply, adjustable motor with directly-driven light
modulator, the light focusing on modulator, comparator, light receiving hole and
monochrometer entry,
- The wave length of the spectrum ranges from
3000A to 8500A (the other wave length can be achieved by adjusting the grating numbers of
the mono-chrometer).
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ZS-500
ZS-700
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- Vacuum Chamber
648x668x790mm
770x800x916mm
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- Maximum outer diameter
f550mm
f650mm
- of the substrate holder
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- Ultimate Vacuum
6.6x10-14Pa
6.6x10-4Pa
- Pumping Time
7x10-3Pa<15m In
7x10-3Pa<15min
- Evaporation Source
5kW
5kW
- Baking Temperature and Power 300。C / 3kW
300。C / 4.5kW
- Revolving Speed of Substrate 0~30r / min
0~30r / min
- Ion Bombardment
0.6kw / 3kv
0.6kw / 3kv
- Diffusion Pump
k-400
k-600
- Mechanical Pump
2X-30A
2X-70A
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- Film-thickness
MK-1
MK-1
- Monitor System
System Extreme Value Method System Extreme Value Method
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- Vacuum Gauge
CG-Z
CG-Z
- Average Power
20kW
32kW
- Overall Dimension(m)
2.5 x 2.6 x 2m
2.7 x 2.85 x 2.74m
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