VMY-600 HCD Ion Coating System

空心陰極離子鍍膜機

特點

由於在低真空狀態下，氣體受散射和電磁場作用，蒸發離子繞射性好，由它形成的薄膜比在高真空態下形成的薄膜更封閉，交界層的出現膜層粘著性好。

膜層耐磨、耐腐蝕、硬度高。

電離幾率比其他蒸發源高 1 ~ 2 數量級。

本機電器參數可調節。在更換被蒸鍍材料和反應氣體後，再進一步對蒸鍍工藝研究，本機可以廣泛應用於蒸鍍其它性質的膜層。

　

應用範圍

輕工業、裝飾膜、手錶、餐具、不�z鋼基體鍍 Tin (氮化鈦)。

機械工業，刀具、模具和工具鋼基體鍍 Tin 和 Tic。

電子、航空、化工及原子能工業。

　

主要技術性能規範

(1)    薄膜性質                                                         氮化鈦

(2)    工作室尺寸                                                   f600 x 450

(3)    極限真空度                                                     1 x 10^-5托

(4)    抽氣時間                                                         從760托到5x10-4托     15分鐘

(5)    工作真空度                                                      5 x 10^-5托

(6)    工作轉動架                                                     自轉     上海牌男錶殼 200只

(7)    空心陰槍最大功率                                         7.5kW

(8)    槍持續 20分鐘常用功率                                5kW

(9)    烘烤溫度                                                         0 ~ 300^。C

(10)    工件架轉速 ( 300^。C )                                  0 ~ 15轉 / 分 (持續 20分鐘)

　

(11)    耗電量                                                           380V   26.2kW

                                                                                 220V   24.4kW

　

(12)    耗水量 (進水溫25^。C以下，2kg / cm²)       40升分

(13)    氬氣量 (純度 99.9% 以上)                           200毫升 / 分

(14)    氮氣量 (純度 99.9% 以上)                           100毫升 / 分

(15)    體積 (長 x 寬 x 高 )                                       4 x 3 x 2.5m

Brief Introduction

    Gas being affected by diffusion and the magnetic field under low vacuum, the evaporating ion has good circum-radiation. The film thus formed is firmer than that formed under high vaccum and the film layer at the bordering part has good adhesion.

The film formed is wearable, corrosion-proof and strong in hardness.

The ionization rate is one or two scales higher than other vapour sources.

The electrical parameters of this model are adjustable. The material to be evaporated and the reflection gas having been changed and the evaporization technology being further studies, this model can be widely applied to evaporating films of other different properties.

Range of Applications

*    Decorative films in light industry, watch, tableware and stainless steel substrate are TiN coated.

*    In machinery industry, cutting tool, mould and tool steel substrate are TiN or Tic coated.

*    In electronic, aviation, chemical and atomic energy industies.

　

Main Technical Specifications

(1)    Film Nature:                                                     TiN

(2)    Vacuum Chamber:                                        f600 x 450mm

(3)    Ultimate Vacuum: (Empty Clean Chamber)     1 x 10^-5 Torr

(4)    Pumping Time: (Empty Clean Chamber)          From 760 to 5 x 10^-4 Torr within 15 minutes

(5)    Work Vacuum:                                                 5 x 10^-5 Torr

(6)    Substrate Rack:                                                 200 pieces of Shanghai Brand man's watch case

(7)    Revolving Way:                                                Rotation

(8)    Maximum Power of HCD:                                7.5 kW

(9)    Operation Power of the Gun

        Working for 20 Minutes:                                   5 kW

(10)    Baking temperature:                                        0 ~ 300。

(11)    Revolving Speed of the

          Substrate Rack at 300^。C:                              (rpm) 0 ~ 15 ( lasting for 20 Minutes)

(12)    Power Consumption:                                      380 V, 26.2kW/220 V, 24.4kW